Ablation dominated process – “cold” material removal   High precision   Absolutely micro-scale applications   Material insensitive Machining Quality ns vs fs in hole drilling in stainless steel ns laser fs laser 250 µm wide channel in PET 100 µm dia. thru hole in Inconel (no post processing) Molybdenum Mask Fabrication Molybdenum mask processed with femtosecond laser 2-D Bar Code in Glass Photomask Defect Repair Chromium-on-fused-silica photomasks for deep-ultraviolet photolithography. Chrome layer without damage to underlying glass substrate. Femtosecond Ti:S laser, 400 nm wavelength, 100 fs pulse width. Line width: 200 nm Before Repair After Repair